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> Astex AX7610 rf F120101 sapphire plasma source tube
Astex AX7610 rf F120101 sapphire plasma source tube
Astex RF p/n F120101 rev 1cAmat pn 3750-10112 used
The AX7610 is a microwave plasma source for downstream chemical etch applications, such as photoresist stripping and hard mask removal. With replaceable quartz or sapphire tubes, the AX7610 downstream source offers flexibility of configuration to meet the most demanding application process parameters. The sapphire tube version is compatible with much more severe CF4 and NF3 chemistries for isotopic etch and other applications.
Applied part number: 3750-0112
Operating pressure: 2 to 8 Torr
Elect requirments: 24VDC 1 Amp
O2, N2, H2O, Ar, NF3, CF4, F6, and other Florine based gases
