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> Ae advanced energy 94CM linear ion beam source lis 84CM
Ae advanced energy 94CM linear ion beam source lis 84CM
***My first unit has sold but my second unit is available. I am the process of rebuilding it. It will be essentially the same except for the following: the outer water cooling tubes have been bent close to 90 degrees (on purpose and have a good radius) to allow for a different mounting configuration. One area of the cooling tube around the outside of the main unit had been somewhat dented in but it has been tested and will not restrict the flow and maintains the required flow rate. It will not affect operation. Please allow 1 week to finish this procedure.***
With exception to the above mentioned, the pictures are accurate of the final product. I have reduced the original asking price $500 USD due to these cosmetic details.
Useable Source length is 84cm.
The initial condition of this source was questionable when I initially received it. I had the entire LIS rebuilt (with exception to the magnet section as they were in good condition). This unit has been inspected, cleaned and the outer surfaces retextured. The gap is set at 2mm and is free of defects along this edge. There is marks on the outer face but these will not affect operation in anyway. See pictures. Gas distribution system is clean and will provide for uniform gas flow. This unit has fixed magnets internally and will attract dust and any metal particles if left uncovered. This LIS should remain covered until ready for use. It has been handled only with latex gloves since it had been disassembled. Unit uncovered for pictures and then recovered.
General information about LIS sources:
- No filaments or hollow cathodes
- Reactive gas compatible (including 100% O2)
- Industrial, low maintenance design
- Substrate Pre & Post treatment
o Altering surface wetting for optical coats
- Direct deposition of films using precursors
o DLC coatings : Magnetic media, read/write heads
- Ion Beam assisted deposition- Low pressure depositions
Benefits of using an Advanced Energy Ion source
- Non-selective-works with both metallic and dielectric substrates
- Reduces film contamination by removing hydrocarbons and other residuals
- Operates at magnetron sputtering pressures
- Increased film density, producing continuous, pinhole free DLC coats <50A
- Eliminates the need for sputter targets
- Permits new materials and process developments
- Allows disposition of thin film with bulk-like (i.e. denser) properties
- Low process temperatures allow deposition and etch/clean on polymer substrates
- Eliminates substrate biasing
- Reduces target poisoning, increasing the deposition rate
4 mount holes and taped side mounts
No mounting flange and just what is pictured is included. The water lines do have some bends in them but are in good shape. Pictures should give further details. I may be able to supply a suitable DC power supply for your needs. This unit runs best with a 3kV supply but will run good on even higher voltages. Most DC supplies made by Advanced Energy run about 1600 volts. Additionally, if you require a longer source or source to different dimensions, Please inquire. See below for some other general use information from ion source specialist I know. Quoted concerning this source:
For a given discharge voltage, power can be increased by increasing the gas flow until the pressure becomes too high in the chamber and the mode changes to "Diffuse". To increase the power without changing modes, then the pumping speed must be increased to reduce the chamber pressure.
The "Columnated" mode is the most useful for control of ion energy, pretreatment and surface modification and activation of surfaces, Ion assisted deposition, ion deposition of films, etc. This mode also has a high efficiency, with a bell curve energy distribution with a mean energy of 1/2 the discharge voltage. Also little contamination happens in this mode.
The diffuse mode will contaminate the substrate with the ion source pole piece material. The cathodes can be coated in Aluminum to change the contamination, and also enhance charge neutralization.
Mode switching, "columnated to diffuse" and back and forth, will need to be minimized or eliminated to reduce the chance of power supply failure, as that can even kill the AE pinnacle specifically designed for this application. This can be done by not running the pressure too high.
To enhance the High voltage mode power the 2mm gap is ideal..
If you need more info, let me know. I am available for consultation.
