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Kla surfscan 7600 patterned wafer inspection system


* SUBSTRATE SIZES: 100MM, 125MM, 150MM, AND 200MM
* PATTERNED WAFER INSPECTION SYSTEM
* CAN DETECT DEFECTS AS SMALL AS 0.15 UM WHILE DEFECTS BELOW 0.2 UM CAN BE DETECTED ON MANY PROCESS LEVELS, INCLUDING NITRIDE, OXIDE, POLYSILICON AND TEOS FILMS
* CAPABLE OF MEASURING DEFECTS ON UNPATTERNED WAFERS AND MEASURING WAFERS FROM 4" TO 8" (CURRENTLY CONFIGURED FOR 6" WAFER SIZE)
* HIGH SENSITIVITY ON AFTER-ETCH AND HIGH TOPOGRAPHY APPLICATIONS
* CIRCULAR INPUT POLARIZATION ENHANCES SENSITIVITY AND DEFECT CAPTURE ON POST-CMP AND OTHER POST-DEPOSITED LAYERS.
THIS EQUIPMENT IS SURPLUS FROM MOTOROLA AND WAS WORKING WHEN REMOVED FROM SERVICE.



Kla surfscan 7600 patterned wafer inspection system